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CP-8000+

CP-8000+

Description

The CP-8000+ is an advanced sample preparation tool that etches a cross section of a sample using an argon ion beam. This process avoids physical deformation and structural damage, without requiring complicated chemical processes. In addition, the system simplifies cross-sectional analysis of the sample by processing large areas from tens of um to several mm. 

Applications

Specifications

Gas UsedAr(Argon) gas
Milling Speed700 μm/h (Si at 8kV)
Accelerating Voltage2~8 kV
Beam DiameterApprox. 500 μm
Working Pressure 4.3 x 10-5 torr
Beam AlignmentPrecision beam alignment
using Digital Micrscope
Maximum Sample Size20(W) x 10(D) x 9(H)mm
Sample Moving Range(Z: ±2mm, Y: ±2mm)
Stage Swing Rotation -35° ~ +35°
Stage for Flat MillingTilt Range : 40° to 80°
Rotation Speed : 6 rpm/min
Sample Size : Ø30 x 11.4mm
Display Touch panel (1024 x 600 7 inch display)
Chamber Camera Magnification : x5, x10, x20, x40
4 step brightness control
Ion beam observation mode
Digital Camera for sample alignmentMagnification : x5, x10, x20, x40
USB type
Evacuation SystemTurbo-molecular pump (66L/s)
+ Diaphragm pump
Dimension610(W) x 472(D) x 415(H)mm

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